Discover the most versatile and powerful tool ever created to accelerate advanced material innovation, rapid process testing and device development with atomic precision.
Experience the unprecedented flexibility and material versatility of NANOFABRICATOR™ Lite.
We invite you to experience the NANOFABRICATOR™ Lite and its capabilities in action – from atomic scale thickness variability to multi-cycle and multi-material deposition. Contact our team to book a demo.
ATLANT 3D’s proprietary DALP™ – DIRECT ATOMIC LAYER PROCESSING technology is enabling a paradigm shift across the whole value chain from advanced material innovation to advanced manufacturing of industrial solutions.
Current Photolithography-based process
ATLANT 3D DALP™ DIRECT ATOMIC LAYER PROCESSING
Our patent pending rapid and direct atomic layer processing technology DALP™ offers rapid material and process development and testing, maskless process flexibility, and unparalleled prototyping speed, reducing the time of design iterations, resource allocation and cost of innovation.
NANOFABRICATOR™ Lite enables multi-material deposition in one process, tested on a wide range of advanced materials, independent of surface roughness and substrate sensitivity with multi-shape deposition and a high degree of thickness control.
Direct patterning & complex designs with arbitary shapes
Atomic scale thickness variability & precise gradient control
Depositions on complex surface geometries & sensitive materials
Broad material versatility e.g. dielectrics and metals
Our team of highly skilled engineers and scientists with extensive expertise in material and process R&D, advanced application development and system engineering are here to help with any questions you may have.
